Research Group of Institute of Optics and Fine Mechanics, Chinese Academy of Sciences Thin Film Optics Research Group made new progress in the research of laser pulse width broadening technology in the excimer lithography system: A pulse width broadening structure based on double beam splitter and multiple mirrors was proposed, Related research results have applied for a patented invention "an excimer laser pulse broadening device based on double beam splitting components."
In an excimer laser exposure optical system, the lifetime of an optical element determines the useful life of the lithographic apparatus and the manufacturing cost of the microelectronic device. The service life of the optical element is directly related to the peak power density of the laser beam in the exposure optical system. The lower the peak power density, the longer the lifetime of the optical component. On the other hand, the laser output power needs to be as high as possible in order to improve the use efficiency and yield of the exposure optical system. Since the yield of the exposure optical system is mainly proportional to the output power of the laser and is independent of the pulse width of the single pulse, widening the output pulse width while increasing the laser output power can not only effectively improve the productivity of the exposure optical system, but also effectively reduce Exposing the peak power density of the laser beam in the optical system extends the life of the optical component and reduces the manufacturing cost of the microelectronic device.
In the study of pulse width broadening technology, the research group proposed a pulse width broadening structure based on dichroic mirror and multiple mirrors. The existing pulse width broadening structure usually consists of a single dichroic mirror and a plurality of mirrors. The advantages of the novel structure are that: by optimizing the dichroic ratio of the two dichroic mirrors, the laser output pulse waveform can be significantly improved and the laser pulse can be further reduced Instantaneous peak power to improve the life of the optics in the exposure optics.
(A) is a schematic diagram of a pulse width broadening structure based on a dichroic mirror and a four-mirror, (b) is a program simulation pulse width broadening of the laser pulse after passing through a dichroic mirror structure and a single beamsplitter structure Output laser pulse waveform comparison chart.
Figure (a) pulse width structure diagram
Figure (b) contrast after the broadened laser pulse waveform
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